Home > Dry Vacuum Pump >

GRM602 Multi-Stage Roots Dry Vacuum Pump 600 m³/h Oil-Free Medium-Capacity Vacuum Pump for Semiconductor Process

Product Categories

Rotary Vane Vacuum Pump [57]
SRV Series Single-stage Oil Rotary Vane Vacuum Pump [4]
DRV series Two-Stage Oil Rotary Vane Vacuum Pump [1]
Scroll Vacuum Pump [13]
Dry Screw Vacuum Pump [13]
Roots Vacuum Pump [25]
Booster Vacuum Pump [5]
Vacuum Pump System [4]
Oil Mist filter [6]
High Vacuum Valve [3]
Vacuum Pump Oil [2]
Molecular Vacuum Pump [9]
Dry Vacuum Pump [13]

Ningbo Baosi Energy Equipment Co., Ltd.

Trust Seal

Verified Supplier

Credit Check

Supplier Assessment

Contact Now

GRM602 Multi-Stage Roots Dry Vacuum Pump 600 m³/h Oil-Free Medium-Capacity Vacuum Pump for Semiconductor Process

Name: GRM602 MultiStage Roots Dry Vacuum Pump 600 mh OilFree MediumCapacity Vacuum Pump for Semiconductor Process
Brand: Baosi
Price: 1 USD

Ultimate Pressure : ≤0.15 Pa

Noise : ≤63 dB(A)

Payment Terms : T/T

Outlet : KF25

Weight : 260 kg

N2 Purge : 0.2-0.6 MPa, 12-50 L/min

Place of Origin : China

Price : Negotiable

Delivery Time : 15-30 Working Days

Inlet : ISO100

Dimensions : 865×344×751 mm

Brand Name : Baosi

Cooling Water : 0.1-0.6 MPa, ≥4 L/min

Motor Power : 1.9+1.9 kW

Certification : CE

Packaging Details : Export Standard Wooden Case Packaging

Voltage : 380V/3-Phase

MOQ : 1 Set

Pumping Speed : 600 m³/h

Model Number : GRM601

Supply Ability : 50 Sets/Month

Contact Now

GRM602 Multi-Stage Roots Dry Vacuum Pump — 600 m³/h Medium-Capacity Solution

The GRM601 is a medium-capacity multi-stage roots dry vacuum pump delivering 600 m³/h pumping speed with an impressive ultimate pressure of ≤0.15 Pa. Its dual 1.9+1.9 kW permanent magnet synchronous motors provide reliable oil-free vacuum for semiconductor, photovoltaic, and lithium battery applications.

Key Features

Multi-Stage Roots Design: High pumping speed with low power consumption
Dual Motor Configuration: 1.9+1.9 kW for balanced, efficient operation
Ultra-Low Ultimate Pressure: ≤0.15 Pa for demanding process requirements
Ultra-Quiet: ≤63 dB(A) — ideal for cleanroom environments
Oil-Free Mechanism: Zero oil contamination for sensitive processes
Superior Particle Handling: Advanced rotor structure for dusty processes
Compact Integration: 865 * 344 * 751 mm, 260 kg
Dust & Vapor Insensitive: Reliable with process byproducts and moisture
Advanced Sealing: Lip seal + labyrinth + nitrogen purge protection
Remote Intelligence: I/O and RS485 (Modbus) for factory automation

Technical Specifications

Model	GRM602
Pumping Speed	600 m³/h
Ultimate Pressure (w/o purge)	≤0.15 Pa
Motor Power	1.9 + 1.9 kW
Voltage	380V (3-Phase)
Inlet Connection	ISO100
Outlet Connection	KF25
Noise Level	≤63 dB(A)
Weight	260 kg
Dimensions (LWH)	865 * 344 * 751 mm
Cooling Water Pressure	0.1–0.6 MPa
Cooling Water Flow	≥4 L/min
N₂ Purge Pressure	0.2–0.6 MPa
N₂ Purge Flow	12–50 L/min
Operating Temperature	5–40°C; ≤90% RH

Applications

Semiconductor: PECVD, MOCVD, SACVD, RTP, HDP-CVD, ALD, Metal Etch, Silicon Etch
Photovoltaic: Crystal growth, solar cell manufacturing
Lithium Battery: Cell drying, electrolyte filling, degassing
Flat Panel Display: LED and LCD manufacturing processes

Product Tags: